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EE3001:Solid State Devices

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A phosphorus doped (1015 atoms/cm3) Si sample has resistivity of 𝝆 Ω-cm. This sample is now doped with additional boron atoms to increase the resistivity of the doped sample to at least 5𝝆.  Assume that due to this additional boron doping electron and hole mobilities are not changed and electron mobility is three times of the hole mobility throughout. The concentration of the additional boron atoms required is within the range from × 1015 atoms/cmto × 1015 atoms/cm3.

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The

position of the Fermi level for a silicon sample is at E

f

= Ei +

0.45 eV at 300 K. The sample is uniformly illuminated, thereby generating an

additional 10

13 electron-hole pairs per cm3

per second.

The minority carrier lifetime in this sample is 1 μs. Assume n

i

for

Si is 10

10 /cm3

and kT = 26 meV at 300 K. For this

illuminated sample,

at

300 K the position of electron quasi Fermi level (in eV) is at E

Fn

=

Ei +

at

300 K the position of hole quasi Fermi level (in eV) is at E

Fp

= Ei

+

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Consider a p-type silicon sample with Ef

= E

i - 0.45 eV and a n-type silicon sample with Ef

= Ei +

0.25 eV. The built-in (contact) potential across the junction of these two

materials (in Volts) is ………

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An

abrupt silicon p

+n junction diode is reverse biased with a voltage VR

.

The built-in potential is V

bi. The depletion layer width is 1 x 10-4 cm when VR + Vbi

= 8 V. For silicon, assume

eS= 10-12

F/cm. The doping concentration in

the n – layer is

1016/cm3

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An abrupt p+n junction has a built-in potential of 0.75 V and the maximum electric field at a reverse bias of 1 V is 1*10^4 V/cm. The maximum electric field will be 2*10^4 V/cm at a reverse bias voltage (in Volts) of

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In

a p-n junction, N

A = 1016 /cm3 and ND

= 10

17 /cm3. Also consider that ni = 106

/cm

3, Eg = 1.4 eV and kT = 0.026 eV at 300 K.

The

built-in potential at 300 K (in Volts) is

The

built-in potential at 400 K (in Volts) is

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An

abrupt silicon p

+n junction diode is reverse biased with a voltage VR

.

The built-in potential is V

bi. The depletion layer width is 1 x 10-4 cm when VR + Vbi

= 4 V. For silicon, assume

eS= 10-12

F/cm. The doping concentration in

the n – layer is

1016/cm3

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An

abrupt p

+

n

junction has a built-in potential of 0.75 V and the maximum electric field at a

reverse bias of 2 V is 1 x 

104 V/cm. The maximum electric field will be 2 x 104 V/cm at a reverse bias voltage (in Volts) of

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In

a p-n junction, N

A = 1016 /cm3 and ND

= 10

15 /cm3. Also consider that ni = 1013

/cm

3, Eg = 0.67 eV and kT = 0.026 eV at 300 K.

The

built-in potential at 300 K (in Volts) is

The built-in

potential at 400 K (in Volts) is

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1016 phosphorus atoms/cm3 are introduced in Si. Assuming complete ionization, EG,Si = 1.12 eV, Nc=3.2 x 1019(T/300)1.5 cm−3 and Nv=1.8 x 1019 (T/300)1.5 cm−3, kBT=0.026 eV (at 300 K) and ni = 1010 /cm3 (at 300 K), find out Ec −Ef at 600K. Enter answer without units upto four significant digits

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