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A phosphorus doped (10 16 atoms/cm 3 ) Si sample has resistivity of 𝝆 Ω-cm....

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A phosphorus doped (1016 atoms/cm3

)

Si sample has resistivity of

𝝆

Ω-cm. This sample is now doped with additional boron

atoms to increase the resistivity of the doped sample to

at least 4𝝆

.  Assume that due to this additional boron

doping electron and hole mobilities are not changed and electron mobility is

three times of the hole mobility throughout. The concentration of the

additional boron atoms required is within the range from

× 1016 atoms/cm3 to × 1016 atoms/cm3.

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